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Layer-by-Layer Assembled Heteroatom-Doped Graphene Films with Ultrahigh Volumetric Capacitance and Rate Capability for Micro-Supercapacitors
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Layer-by-Layer Assembled Heteroatom-Doped Graphene Films with Ultrahigh Volumetric Capacitance and Rate Capability for Micro-Supercapacitors
Posted:2016-03-18 17:19    Column:2014
Z.-S. Wu, K. Parvez, A. Winter, H. Vieker, X. Liu, S. Han, A. Turchanin, X. Feng*, K. Müllen*,
Advanced Materials 2014, 26 (26): 4552-4558. 
DOI: 10.1002/adma.201401228  [PDF]

Abstract
Here we describe the development of large-area, highly uniform, ultrathin, nitrogen and boron co-doped graphene (BNG)films for high-performance MSCs. The BNG film was prepared using a layer-by-layer (LBL) assembly of anionic graphene oxide(GO) nanosheets and cationic poly-L-Lysine (PLL) as a nitrogen containing precursor, followed by intercalation of H3BO3 within the layers and annealing treatment. The PLL and H3BO3 incorporated into the assembled multilayer films not only serve as nitrogen- and boron-rich precursors, respectively, but also generate micropore fillers to promote the formation of porous, yet densely packed BNG films during the thermal treatment. All-solid-state planar MSCs were manufactured by lithographically dry-etching the as-produced BNG films on silicon wafers, providing a pronounced pseudocapacitive behavior with ultrahigh volumetric capacitance (∼488 F/cm 3 ). This is the highest value reported to date for graphene-based supercapacitors and an ultrahigh operation scan rate of up to 2000 V/s.

Dalian Institute of Chemical Physics, CAS
457 Zhongshan Road Dalian, China 116023
E-mail: wuzs@dicp.ac.cn
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