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Photolithographic Fabrication of High-Performance All-Solid-State Graphene-Based Planar Micro-Supercapacitors with Different Interdigital Fingers
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Photolithographic Fabrication of High-Performance All-Solid-State Graphene-Based Planar Micro-Supercapacitors with Different Interdigital Fingers
Posted:2016-03-18 17:15    Column:2014
Z.-S. Wu, K. Parvez, X. Feng*, K. Müllen*,
Journal of Materials Chemistry A 2014, 2 (22): 8288-8293. 
DOI: 10.1039/c4ta00958d  [PDF]

Abstract
Here we demonstrated the fabrication of ultrahigh rate, all-solid-state, planar interdigital graphene-based micro-supercapacitors (MSCs) manufactured by methane plasma-assisted reduction and photolithographic micro-fabrication of graphene oxide films on silicon wafers. Notably, the electrochemical performance of MSCs is significantly enhanced by increasing the number of the interdigital fingers from 8 to 32 and minimizing the finger width from 1175 to 219 μm, highlighting the critical importance of adjusting the number and widths of the fingers in the fabrication of high-performance MSCs. The fabricated graphene-based MSCs delivered an area capacitance of 116 μF cm−2and a stack capacitance of 25.9 F cm−3. Furthermore, they offered a power density of 1270 W cm−3that is much higher than that of electrolytic capacitors, an energy density of ∼3.6 mW h cm−3that is comparable to that of lithium thin-film batteries, and a superior cycling stability of ∼98.5% capacitance retention after 50 000 cycles. More importantly, the microdevice can operate well at an ultrahigh scan rate of up to 2000 V s−1, which is three orders of magnitude higher than that of conventional supercapacitors.

Dalian Institute of Chemical Physics, CAS
457 Zhongshan Road Dalian, China 116023
E-mail: wuzs@dicp.ac.cn
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